Sample characterization and device fabrication

While block copolymers allow dense patterning of graphene at a scale smaller than any other technique, they are intrinsically best suited for uniform patterns. We use ultrahigh resolution electron beam lithography and block copolymer lithography, to guide the block copolymers the waveguides and other more complex  devices. Since the position of each atom can be important, high resolution transmission electron microscopy is carried out to optimize the patterns, and to look for defects and contamination, and even modify the patterns using the high energy electrons from the microscope. The devices are characterized electrically, to understand how the nanopatterned graphene devices behave and can be improved.

 Peter Bøggild

Peter Bøggild (Leader)
Associate Professor
DTU Nanotech

Device fabrication, electrical measurements
24 JANUARY 2021